Effect of Substrate Temperature and Deposition Power on the Surface Morphology and Optical Properties of ZnO:Mg Thin Films Deposited by DC Magnetron Sputtering

Authors

  • Saidi Saidi Baobab Secondary School, Mapinga Village, Bagamoyo District, Dar es Salaam, Tanzania.
  • Margaret E. Samiji Physics Department, University of Dar es Salaam, Dar es Salaam, Tanzania.
  • Nuru R. Mlyuka

Keywords:

nO:Mg, Transparent conducting oxides, Band gap energy, Optical properties, morphology properties

Abstract

Magnesium doped zinc oxide (ZnO:Mg) thin films were deposited on soda lime glass slides by DC magnetron sputtering method. Atomic force microscope (AFM), and UV/VIS spectrophotometer were used to investigate the effect of sputtering power and substrate temperature on the surface morphology and optical properties of ZnO:Mg thin films. AFM images revealed that sputtering power and deposition temperature have significant influence on surface morphology of the ZnO:Mg thin films. For all sputtering powers and substrate temperatures investigated, ZnO:Mg films had peak transmittance above 85%. Samples deposited at 110 W sputtering power and 450 °C substrate temperature showed the best peak transmittance of > 90% at 560 nm (visible range). Optical band gap of ZnO:Mg films was in the range of 3.44– 3.69 eV depending on the substrate temperature. The results indicated the potential of the films for transparent conductor applications.

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Published

2024-01-31

Issue

Vol. 49 No. 5 (2023)

Section

Physical Sciences

License

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